New York, United States, Nov. 18, 2024 (GLOBE NEWSWIRE) — Atomic Layer Deposition is an advanced thin-film deposition method that creates layers at the atomic scale with unmatched precision and consistency. This technique is critical in industries where precise coating control is essential, such as semiconductor manufacturing, energy storage, and high-performance optics. ALD works through a cycle of sequential, self-limiting chemical reactions, which enable the formation of ultra-thin films with excellent uniformity, even on complex surfaces. This makes ALD ideal for applications that require high-performance coatings on intricate structures.

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Market Dynamics

Rising demand for high-performance semiconductors in electronics drives the global market

The global market is seeing rapid growth driven by rising demand for high-performance semiconductors in the electronics sector. As consumer electronics—such as smartphones, tablets, and wearables—become more advanced, there is an increased need for semiconductors that deliver high performance, miniaturization, and energy efficiency.

Atomic Layer Deposition plays a pivotal role here, enabling the precise application of ultra-thin films with atomic-level control, which is essential for producing the next generation of semiconductor devices with improved functionality and reliability.

• For example, in 5G-enabled devices, smaller and more efficient semiconductors are crucial to support faster processing speeds and connectivity. ALD technology supports this demand by facilitating the deposition of conformal, high-quality films necessary for these advanced chips.

As semiconductor designs grow more complex and the electronics industry continually innovates, the need for ALD equipment will only intensify. This demand underscores the importance of meeting stringent performance standards and maintaining a competitive edge in a technology-focused market.

Growing investments in research and development for ALD technology create tremendous opportunities

The global market is set for significant growth as investments in research and development (R&D) for Atomic Layer Deposition technology surge. These R&D efforts are enhancing ALD capabilities, enabling innovation across sectors. Collaborative projects between semiconductor companies, universities, and research institutions are propelling the development of advanced ALD materials and processes.

For instance, partnerships between leading semiconductor firms and academic researchers have led to ALD advancements for flexible electronics and high-efficiency solar cells, broadening ALD’s applications. In addition, companies like ASM International and Applied Materials are pioneering new deposition techniques that reduce processing times and costs, making ALD more efficient and scalable.

The influx of R&D funding accelerates ALD advancements, opening opportunities for market growth. This progress allows for ALD adoption across diverse fields, including biotechnology and energy solutions, while enabling the production of high-performance components that meet the evolving demands of next-generation technologies.

Regional Analysis

Asia-Pacific leads the global market, holding a substantial 45% share, largely due to its strong semiconductor manufacturing and electronics production industries. This dominance is fueled by rapid industrialization, major investments in technological infrastructure, and rising demand for consumer electronics and advanced materials.

Key players in this growth include China, South Korea, and Taiwan. China’s commitment to becoming self-sufficient in semiconductor production, bolstered by government support and investments, has significantly boosted demand for advanced deposition technologies like ALD. In South Korea, tech giants such as Samsung and SK Hynix are investing heavily in ALD to improve the performance of their next-gen memory chips and processors.

Additionally, Asia-Pacific’s expanding electronics manufacturing sector is supported by increasing R&D investment, which is advancing ALD technology applications in flexible electronics, high-efficiency solar cells, and innovative materials. These factors collectively strengthen Asia-Pacific’s leading position in the ALD equipment market and support its sustained growth trajectory.

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 Key Highlights

• The global ALD (Atomic Layer Deposition) equipment market size was valued at USD 5,600.23 million in 2023 and is projected to grow from USD 6,171.21 million in 2024 to reach USD 12,179.82 million by 2032, expanding at a CAGR of 10.2% during the forecast period (2024–2032).
• By type, batch Atomic Layer Deposition (ALD) is the dominant segment in the global market, primarily due to its efficiency in processing multiple wafers simultaneously. 
• By application, semiconductors dominate the market, fueled by the surging demand for advanced electronic devices and integrated circuits.
• By end-user industry, the electronics sector is the largest end-user, driven by its crucial role in semiconductor manufacturing.
• Asia-Pacific is the highest shareholder in the global market.

Competitive Players

1. Applied Materials, Inc.
2. ASM International N.V.
3. Tokyo Electron Limited
4. Lam Research Corporation
5. Hitachi High-Tech Corporation
6. Veeco Instruments Inc.
7. Oxford Instruments plc
8. KLA Corporation
9. Sentech Instruments GmbH
10. ULVAC, Inc.
11. Semilab Semiconductor Physics Laboratory
12. Kurt J. Lesker Company
13. Nano-Master, Inc.
14. AIXTRON SE
15. TSMC

Recent Developments

• In June 2024, ASM International announced a substantial $300 million investment to expand its semiconductor research and development (R&D) operations in Arizona, USA. This strategic move underscores the company’s commitment to advancing semiconductor technology and meeting the rising demand for high-performance electronic components.

Segmentation

1. By Type

1. 1. Batch ALD
   2. Spatial ALD

2. By Applications

2. 1. Semiconductors
   2. Energy Storage
   3. Optical Coatings
   4. Medical Devices

3. By End-User Industry

3. 1. Electronics
   2. Automotive
   3. Healthcare
   4. Aerospace & Defense
   5. Energy

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